Dr. Teplyakov will discuss how surfaces and interfaces play an important role in development of modern microelectronics, optoelectronics, biosensing and other fields.
This seminar will cover approaches to tune the properties of interfaces, surfaces, and subsurface layers of participating materials by chemical functionalization. Specifically, the amino-groups of a general formula NHx used to control surface reactions on semiconductor surfaces, to promote deposition schemes on surfaces of thin solid diffusion barrier films, and to provide reliable surface sites for biofunctionalization of self-assembled monolayers.
In all of these cases, the reactivity of the amino-group can be designed to fit the required application. Dr. Teplyakov’s group uses selected temperature regimes, alkyl, aryl, and other substituents to alter the reactivity of amino-terminated surfaces and to reversibly tune the properties of surface and subsurface layers in thin solid films and in “soft” self-assembled monolayers.
His research also compares the amino-functionalized surfaces with more traditional substrates, such as, for example, hydrogen-terminated semiconductor crystals. The preparation, analysis with multiple surface analytical microscopic and spectroscopic techniques, computational approaches to understanding surface reactivity, structure, and stability of these aminofunctionalized surfaces and interfaces will also be addressed.